GENTRON OVEN GT2000-18 (N2 INLET)

GENTRON OVEN GT2000-18 (N2 INLET)

Category: THERMAL PROCESSING TECHNOLOGY Available
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Description

GENTRON OVEN GT2000-18 (N2 INLET)

About This Project

The GENTRON GT2000-18 is a precision-engineered thermal test oven designed for high-dissipation Forward Bias, elevated-temperature Reverse Bias, and Dynamic or Static Burn-In of integrated circuits and other semiconductor devices. Its advanced engineering provides accurate temperature control, uniform thermal distribution, and reliable process repeatability, meeting the stringent requirements of critical semiconductor testing applications.

Category

Thermal Processing Technology

Project Features

1

Chamber Volume: 5 to 26 cu.ft

2

Temperature Range: Ambient to +210 °C

3

Control Accuracy: +1.0 °C

4

Temperature Uniformity: +3 °C (measured without load)

5

Control System: PLC with HMI interface

6

Data Acquisition: Multi-channel temperature recording

7

Nitrogen Inlet (Optional): Timer-controlled; inert nitrogen displaces oxygen to protect sensitive materials during testing


More detail about LLT Engineering Sdn Bhd
LLT Engineering Sdn Bhd
LLT Engineering Sdn Bhd Test Chamber Supplier Penang, Walk In Oven, Salt Spray Chamber Supply Malaysia, Industrial Refrigerator, Lab Equipment Supplies ~ LLT Engineering Sdn Bhd
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