Ascent AP Pulsed and DC Power System:
Cooling: Hybrid (air and water)
Output Frequency (MHz, kHz): 5 to 150 kHz
Input Voltage (V): 400, 440, 440-480 VAC
Power Level (kW): 10 to 30 kW
Rack Width: Full rack
Height (Inches): 4U, 6U
Output Voltage Range (V): 400-1000V
Communications Interface: Ethernet, EtherCAT, ProfiNet, Profibus, RS-232/485, EtherNet/IP, and analog communications
Advanced Features: Progressive arc management
Process Applications: Deposition
Ignition Voltage (V): 1200
Description
Unprecedented Power Control for Single- and Dual-Magnetron Sputtering Building on AE®’s premier bipolar pulsed-DC technology, Ascent® AP power supplies extend your ability to optimize output with advanced pulse shaping, as well as four-block progressive arc management that includes full voltage reversal and self-adjusting arc parameters. This compact solution’s patented pulsing technology proactively inhibits arcs, while its wide operational range unlocks material options to extend single- and dual-magnetron process flexibility and material innovation.
.Key Features
Process customization with extensive power delivery parameters
Advanced process management through a tiered approach to arc mitigation
Compact, single-unit solution (up to 30 kW)
Set Point Compensation™ technology for stable throughput
Wide operational range to enable a variety of process materials
Compatible with PowerInsight by Advanced Energy™
Benefits
Precise sputtering of dielectric and conductive films
Expanded process control, flexibility, and innovation
